Rogowski named Fellow in American Bar Foundation

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Patricia-S-Rogowski
Patricia -Rogowski

The intellectual property law firm Panitch Schwarze Belisario & Nadel LLP  announced that partner Patricia Smink Rogowski has been selected as a Fellow of the American Bar Foundation, the nation’s leading research institute for the empirical study of law

Only one percent of the attorneys in the United States are admitted to the American Bar Foundation as Fellows. Selection requires nomination by the institute’s national Fellows and recommendation by both the national American Bar Foundation Fellows and those in the state in which the nominee practices.  Rogowski was chosen by the Fellows in Delaware.

“Pat is an extraordinary IP attorney and recognized as a leader in the field, not only in Delaware but across the country,” said Ronald L. Panitch, partner in the firm’s Philadelphia office and an American Bar Foundation Fellow for Pennsylvania. “This selection is surely gratifying for her, but it is just as gratifying for her colleagues here at Panitch Schwarze. We congratulate Pat on her commitment to practicing our profession at the highest level, and on the service and leadership that have earned her this recognition.”

Rogowski has more than 29 years of experience in patent, trademark and copyright prosecution and counseling, and in intellectual property litigation in federal district courts and in appeals to the Court of Appeals for the Federal Circuit. Rogowski is a Delaware and Pennsylvania bar member admitted to practice before the District Courts in Delaware and Pennsylvania, as well as the Court of Appeals for the Federal Circuit. She also is registered with the U.S. Patent and Trademark Office.

Rogowski received her B.S. in Mechanical Engineering from Lehigh University with highest honors before going on to earn her J.D. from the University of Pennsylvania. She has been selected as a leading Patent and Trademark Practitioner in Delaware for several consecutive years by Best Lawyers and Super Lawyers, and was selected as one of the Top 250 Women in IP in the United States.

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